Substrate tolerant direct block copolymer nanolithography

Research output: Contribution to journalJournal article – Annual report year: 2015Researchpeer-review

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Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography. However, there is a need for a general approach to BC lithography that critically considers all the steps from substrate preparation to the final pattern transfer. We present a procedure that significantly simplifies the main stream BC lithography process, showing a broad substrate tolerance and allowing for efficient pattern transfer over wafer scale. PDMS-rich poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) copolymers are directly applied on substrates including polymers, silicon and graphene. A single oxygen plasma treatment enables formation of the oxidized PDMS hard mask, PS block removal and polymer or graphene substrate patterning.
Original languageEnglish
JournalNanoscale
Volume8
Issue number1
Pages (from-to)136-140
Number of pages5
ISSN2040-3364
DOIs
Publication statusPublished - 2016
CitationsWeb of Science® Times Cited: No match on DOI
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