Towards easily reproducible nano-structured SERS substrates

Publication: Research - peer-reviewArticle in proceedings – Annual report year: 2009

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In this paper we present a quick and easy method for producing relatively large areas of substrate that enhance the Raman effect, using standard semiconductor processing techniques such as reactive ion etching of silicon and electron beam metal deposition. As standard cleanroom processes are used, it is possible to narrowly control the parameters of the fabrication process to create silicon nano-pillars with controlled heights and spacing. The silicon nano-pillars are coated by thin films of silver and/or gold to create surfaces that greatly enhance the Raman effect. Surface enhanced Raman scattering (SERS) has numerous applications in chemical sensing, with high sensitivity and fast analysis speed seen as the main advantages, and these novel substrates are believed to be able to make SERS more applicable.
Original languageEnglish
Title of host publicationSensors, 2009 IEEE
PublisherIEEE
Publication date2009
Pages1763-1767
ISBN (print)978-1-4244-4548-6
DOIs
StatePublished

Conference

Conference8th IEEE Conference on Sensors
CountryNew Zealand
CityChristchurch
Period25/10/0928/10/09

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Copyright 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.

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