Publication: Research - peer-review › Conference article – Annual report year: 2010
A robust topology optimization method is presented to consider manufacturing uncertainties in tailoring dispersion properties of photonic crystal waveguides. The under, normal and over-etching scenarios in manufacturing process are represented by dilated, intermediate and eroded designs based on a threshold projection. The objective is formulated to minimize the maximum error between actual group indices and a prescribed group index among these three designs. Novel photonic crystal waveguide facilitating slow light with a group index of n(g) = 40 is achieved by the robust optimization approach. The numerical result illustrates that the robust topology optimization provides a systematic and robust design methodology for photonic crystal waveguide design.
|Journal||A I P Conference Proceedings Series|
|Workshop||3rd International Workshop on Theoretical and Computational Nano-Photonics|
|Period||03/11/10 → 05/11/10|
|Citations||Web of Science® Times Cited: No match on DOI|
- Crystal optics, Robust optimization, Manufacturing processes, Energy gap (physics), Photons, Permittivity, Wave guides
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