Sputtering of cryogenic films of hydrogen by keV ions : Thickness dependence and surface morphology
Publication: Research - peer-review › Conference article – Annual report year: 2009
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Sputtering of cryogenic films of hydrogen by keV ions : Thickness dependence and surface morphology. / Schou, Jørgen; Hilleret, Noel.
In: Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, Vol. 267, No. 16, 2009, p. 2748-2751.Publication: Research - peer-review › Conference article – Annual report year: 2009
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TY - CONF
T1 - Sputtering of cryogenic films of hydrogen by keV ions
T2 - Thickness dependence and surface morphology
A1 - Schou,Jørgen
A1 - Hilleret,Noel
AU - Schou,Jørgen
AU - Hilleret,Noel
PB - Elsevier BV
PY - 2009
Y1 - 2009
N2 - The sputtering yield induced by keV hydrogen ions measured at CERN and at Risø National Laboratory for solid H2 and D2 at temperatures below 4.2 K decreases with increasing film thickness from about 100 x 10(15)molecules/cm2. For a film thickness comparable to or larger than the ion range the data from Risø show a slight increase, whereas the yield from CERN continues to decrease up to very large film thicknesses, i.e. one order of magnitude larger than the ion range. The different behavior of the yield is discussed in terms of the probable growth modes of the films. The films produced at the Risø setup are quench-condensed films, while those produced at CERN are supposed to grow with large hydrogen aggregates on top of a thin bottom layer.
AB - The sputtering yield induced by keV hydrogen ions measured at CERN and at Risø National Laboratory for solid H2 and D2 at temperatures below 4.2 K decreases with increasing film thickness from about 100 x 10(15)molecules/cm2. For a film thickness comparable to or larger than the ion range the data from Risø show a slight increase, whereas the yield from CERN continues to decrease up to very large film thicknesses, i.e. one order of magnitude larger than the ion range. The different behavior of the yield is discussed in terms of the probable growth modes of the films. The films produced at the Risø setup are quench-condensed films, while those produced at CERN are supposed to grow with large hydrogen aggregates on top of a thin bottom layer.
KW - Sputtering
KW - Solid hydrogen
KW - Low temperature
KW - Growth of films
U2 - 10.1016/j.nimb.2009.05.024
DO - 10.1016/j.nimb.2009.05.024
JO - Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
SN - 0168-583X
IS - 16
VL - 267
SP - 2748
EP - 2751
ER -