Multilayer coatings for reflecting hard X-rays up to 80keV, like W/Si and Pt/C, have been studied for several years. To go to higher energies, in the range of 100 keV to 250 keV, one needs coatings with smaller d-spacings than can currently be made with these material combinations, and a lower interfacial roughness. With the new material combinations of WC/SiC the interface roughness can be reduced down to between 0.23 nm and 0.25 nm enabling bi-layer thicknesses down to 1.0 nm to reflect efficiently. The production of thinner period coatings thus enables the possibility for focusing optic designs with reasonable focal lengths and throughput up to 250 keV.