Silicon etching by negative ions in ICP and DC discharges produced in Ar/SF6

Publication: ResearchConference abstract in proceedings – Annual report year: 2009

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Original languageEnglish
TitleBook of abstracts
Publication date2009
StatePublished

Conference

Conference2nd International Conference on Microelectronics and Plasma Technology
CityBusan (KR), 22-25 Sep.
Period01/01/09 → …

Keywords

  • Plasma processing, Fusion energy
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