Quantitative strain mapping of InAs/InP quantum dots with 1 nm spatial resolution using dark field electron holography
Publication: Research - peer-review › Journal article – Annual report year: 2011
The optical properties of semiconductor quantum dots are greatly influenced by their strain state.
Dark field electron holography has been used to measure the strain in InAs quantum dots grown in
InP with a spatial resolution of 1 nm. A strain value of 5.4%60.1% has been determined which is
consistent with both measurements made by geometrical phase analysis of high angle annular dark
field scanning transmission electron microscopy images and with simulations.
Original language | English |
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Journal | Applied Physics Letters |
Volume | 99 |
Issue number | 26 |
Pages (from-to) | 261911 |
ISSN | 0003-6951 |
DOIs | |
State | Published - 2011 |
Bibliographical note
Copyright 2011 American Institute of Physics.
Citations | Web of Science® Times Cited: 25 |
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