Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices
Publication: Research - peer-review › Article in proceedings – Annual report year: 2009
Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.
| Original language | English |
|---|---|
| Title | Proceedings, OFC |
| Publisher | IEEE |
| Publication date | 2009 |
| Pages | 1-3 |
| ISBN (print) | 978-1-4244-2606-5 |
| State | Published |
Conference
| Conference | The Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC |
|---|---|
| Country | United States |
| City | San Diego, CA |
| Period | 22-03-09 → 26-03-09 |
Bibliographical note
Copyright: 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE
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