Publication: Research - peer-review › Conference article – Annual report year: 2011
We demonstrate an optimized milling technique to focused ion beam (FIB) milling in template silicon membranes for fast prototyping of nanoelectromechanical systems (NEMS). Using a single-pass milling strategy the highly topology dependent sputtering rate is boosted and shorter milling time is achieved. Drift independence is obtained for small critical features using a radial scan strategy, and a back scan routine ensures minimal line width deviation removing redeposited material. Milling a design similar to a nano four-point probe with a pitch down to 400nm we display what optimized FIB milling in NEMS development can accomplish.
|Conference||36th International Conference on Micro- and Nano-Engineering|
|Period||19/09/10 → 22/09/10|
|Citations||Web of Science® Times Cited: 3|
- Redeposition, Drift, Prototyping, Focused Ion Beam, NEMS
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