Optimization of FIB milling for rapid NEMS prototyping

Publication: Research - peer-reviewConference article – Annual report year: 2011

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We demonstrate an optimized milling technique to focused ion beam (FIB) milling in template silicon membranes for fast prototyping of nanoelectromechanical systems (NEMS). Using a single-pass milling strategy the highly topology dependent sputtering rate is boosted and shorter milling time is achieved. Drift independence is obtained for small critical features using a radial scan strategy, and a back scan routine ensures minimal line width deviation removing redeposited material. Milling a design similar to a nano four-point probe with a pitch down to 400nm we display what optimized FIB milling in NEMS development can accomplish.
Original languageEnglish
JournalMicroelectronic Engineering
Publication date2011
Volume88
Issue8
Pages2671-2674
ISSN0167-9317
DOIs
StatePublished

Conference

Conference36th International Conference on Micro- and Nano-Engineering
Number36
CountryItaly
CityGenoa
Period19/09/1022/09/10
Internet addresshttp://www.mne2010.org/
CitationsWeb of Science® Times Cited: 3

Keywords

  • Redeposition, Drift, Prototyping, Focused Ion Beam, NEMS
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