Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures. / Ou, Yiyu; Jokubavicius, Valdas; Yakimova, Rositza; Syväjärvi, Mikael; Ou, Haiyan.

In: Optics Letters, Vol. 37, No. 18, 2012, p. 3816-3818.

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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Ou, Yiyu; Jokubavicius, Valdas; Yakimova, Rositza; Syväjärvi, Mikael; Ou, Haiyan / Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures.

In: Optics Letters, Vol. 37, No. 18, 2012, p. 3816-3818.

Publication: Research - peer-reviewJournal article – Annual report year: 2012

Bibtex

@article{a78907a94fe24353b296d2f1f3200be8,
title = "Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures",
keywords = "Contact angle, Silicon carbide, Surface chemistry, Fluorescence",
publisher = "Optical Society of America",
author = "Yiyu Ou and Valdas Jokubavicius and Rositza Yakimova and Mikael Syväjärvi and Haiyan Ou",
note = "© Optical Society of America",
year = "2012",
doi = "10.1364/OL.37.003816",
volume = "37",
number = "18",
pages = "3816--3818",
journal = "Optics Letters",
issn = "0146-9592",

}

RIS

TY - JOUR

T1 - Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures

A1 - Ou,Yiyu

A1 - Jokubavicius,Valdas

A1 - Yakimova,Rositza

A1 - Syväjärvi,Mikael

A1 - Ou,Haiyan

AU - Ou,Yiyu

AU - Jokubavicius,Valdas

AU - Yakimova,Rositza

AU - Syväjärvi,Mikael

AU - Ou,Haiyan

PB - Optical Society of America

PY - 2012

Y1 - 2012

N2 - In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern. © 2012 Optical Society of America.

AB - In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern. © 2012 Optical Society of America.

KW - Contact angle

KW - Silicon carbide

KW - Surface chemistry

KW - Fluorescence

U2 - 10.1364/OL.37.003816

DO - 10.1364/OL.37.003816

JO - Optics Letters

JF - Optics Letters

SN - 0146-9592

IS - 18

VL - 37

SP - 3816

EP - 3818

ER -