Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern. © 2012 Optical Society of America.
Original languageEnglish
JournalOptics Letters
Publication date2012
Volume37
Issue18
Pages3816-3818
ISSN0146-9592
DOIs
StatePublished

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© Optical Society of America

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Keywords

  • Contact angle, Silicon carbide, Surface chemistry, Fluorescence
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