Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures
Publication: Research - peer-review › Journal article – Annual report year: 2012
In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern. © 2012 Optical Society of America.
|State||Published - 2012|
© Optical Society of America
|Citations||Web of Science® Times Cited: No match on DOI|
- Contact angle, Silicon carbide, Surface chemistry, Fluorescence
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