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@article{98c64c461cf7482e8270b32748418b28,
title = "Nanopillars: Large Area Fabrication of Leaning Silicon Nanopillars for Surface Enhanced Raman Spectroscopy (Adv. Mater. 10/2012)",
publisher = "Wiley - V C H Verlag GmbH & Co. KGaA",
author = "Schmidt, {Michael Stenbæk} and Jörg Hübner and Anja Boisen",
year = "2012",
doi = "10.1002/adma.201290051",
volume = "24",
number = "10",
journal = "Advanced Materials",
issn = "0935-9648",

}

RIS

TY - JOUR

T1 - Nanopillars: Large Area Fabrication of Leaning Silicon Nanopillars for Surface Enhanced Raman Spectroscopy (Adv. Mater. 10/2012)

A1 - Schmidt,Michael Stenbæk

A1 - Hübner,Jörg

A1 - Boisen,Anja

AU - Schmidt,Michael Stenbæk

AU - Hübner,Jörg

AU - Boisen,Anja

PB - Wiley - V C H Verlag GmbH & Co. KGaA

PY - 2012

Y1 - 2012

N2 - M. S. Schmidt et al. describe on page OP11 a simple, two-step fabrication process to as-semble flexible, freestanding nanopillars into large-area substrates. These substrates can be made using readily available silicon-processing equipment and are suitable for SERS, having a large, uniform Raman enhancement.

AB - M. S. Schmidt et al. describe on page OP11 a simple, two-step fabrication process to as-semble flexible, freestanding nanopillars into large-area substrates. These substrates can be made using readily available silicon-processing equipment and are suitable for SERS, having a large, uniform Raman enhancement.

KW - Surface enhanced raman spectroscopy

KW - Substrate fabrication

KW - Maskless reactive ion etching

KW - Leaning silicon nanopillars;

KW - Hot spots

U2 - 10.1002/adma.201290051

DO - 10.1002/adma.201290051

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 10

VL - 24

ER -