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M. S. Schmidt et al. describe on page OP11 a simple, two-step fabrication process to as-semble flexible, freestanding nanopillars into large-area substrates. These substrates can be made using readily available silicon-processing equipment and are suitable for SERS, having a large, uniform Raman enhancement.
Original languageUndefined/Unknown
JournalAdvanced Materials
Publication date2012
Volume24
Journal number10
ISSN0935-9648
DOIs
StatePublished
CitationsWeb of Science® Times Cited: No match on DOI

Keywords

  • Surface enhanced raman spectroscopy , Substrate fabrication, Maskless reactive ion etching, Leaning silicon nanopillars; , Hot spots

ID: 7783219