View graph of relations

M. S. Schmidt et al. describe on page OP11 a simple, two-step fabrication process to as-semble flexible, freestanding nanopillars into large-area substrates. These substrates can be made using readily available silicon-processing equipment and are suitable for SERS, having a large, uniform Raman enhancement.
Original languageEnglish
JournalAdvanced Materials
Publication date2012
Volume24
Journal number10
ISSN0935-9648
DOIs
StatePublished
CitationsWeb of Science® Times Cited: No match on DOI

Keywords

  • Surface enhanced raman spectroscopy , Substrate fabrication, Maskless reactive ion etching, Leaning silicon nanopillars; , Hot spots
Download as:
Download as PDF
Select render style:
APAAuthorCBEHarvardMLAStandardVancouverShortLong
PDF
Download as HTML
Select render style:
APAAuthorCBEHarvardMLAStandardVancouverShortLong
HTML
Download as Word
Select render style:
APAAuthorCBEHarvardMLAStandardVancouverShortLong
Word

ID: 7783219