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We describe a model for the compliance of a nanoimprint stamp etched with a grid of backside grooves. We integrate the model with a fast simulation technique that we have previously demonstrated, to show how etched grooves help reduce the systematic residual layer thickness (RLT) variations that occur when different patterns lie in close proximity on the stamp.
Original languageEnglish
JournalMicroelectronic Engineering
Publication date2011
Volume88
Issue8
Pages2154-2157
ISSN0167-9317
DOIs
StatePublished

Conference

Conference36th International Conference on Micro- and Nano-Engineering
Number36
CountryItaly
CityGenoa
Period19/09/1022/09/10
Internet addresshttp://www.mne2010.org/
CitationsWeb of Science® Times Cited: 1

Keywords

  • Residual layer, Pattern dependencies, Simulation, Protrusion density, Nanoimprint lithography
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