Modeling and simulation of stamp deflections in nanoimprint lithography: Exploiting backside grooves to enhance residual layer thickness uniformity
Publication: Research - peer-review › Conference article – Annual report year: 2012
We describe a model for the compliance of a nanoimprint stamp etched with a grid of backside grooves. We integrate the model with a fast simulation technique that we have previously demonstrated, to show how etched grooves help reduce the systematic residual layer thickness (RLT) variations that occur when different patterns lie in close proximity on the stamp.
|State||Published - 2011|
|Event||36th International Conference on Micro- and Nano-Engineering - Genoa, Italy|
|Conference||36th International Conference on Micro- and Nano-Engineering|
|Period||19/09/2010 → 22/09/2010|
|Citations||Web of Science® Times Cited: No match on DOI|
- Residual layer, Pattern dependencies, Simulation, Protrusion density, Nanoimprint lithography
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