Minimizing scattering from antireflective surfaces replicated from low-aspect-ratio black silicon

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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@article{650c2e8a3ba2448c8b0eacabaa28afed,
title = "Minimizing scattering from antireflective surfaces replicated from low-aspect-ratio black silicon",
publisher = "American Institute of Physics",
author = "Christiansen, {Alexander Bruun} and Jeppe Clausen and Mortensen, {N. Asger} and Anders Kristensen",
note = "Copyright (2012) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (citation of published article) and may be found at http://apl.aip.org/resource/1/applab/v101/i13/p131902_s1.",
year = "2012",
doi = "10.1063/1.4754691",
volume = "101",
number = "13",
pages = "131902",
journal = "Applied Physics Letters",
issn = "0003-6951",

}

RIS

TY - JOUR

T1 - Minimizing scattering from antireflective surfaces replicated from low-aspect-ratio black silicon

A1 - Christiansen,Alexander Bruun

A1 - Clausen,Jeppe

A1 - Mortensen,N. Asger

A1 - Kristensen,Anders

AU - Christiansen,Alexander Bruun

AU - Clausen,Jeppe

AU - Mortensen,N. Asger

AU - Kristensen,Anders

PB - American Institute of Physics

PY - 2012

Y1 - 2012

N2 - The scattering properties of randomly structured antireflective black silicon polymer replica have been investigated. Using a two-step casting process, the structures can be replicated in Ormocomp on areas of up to 3 in. in diameter. Fourier analysis of scanning electron microscopy images of the structures shows that the scattering properties of the surfaces are related to the spatial periods of the nanostructures. Structures with a dominating spatial period of 160 nm, a height of 200 nm, and aspect ratio of 1.3 show insignificant scattering of light with wavelength above 500 nm and lower the reflectance by a factor of two.

AB - The scattering properties of randomly structured antireflective black silicon polymer replica have been investigated. Using a two-step casting process, the structures can be replicated in Ormocomp on areas of up to 3 in. in diameter. Fourier analysis of scanning electron microscopy images of the structures shows that the scattering properties of the surfaces are related to the spatial periods of the nanostructures. Structures with a dominating spatial period of 160 nm, a height of 200 nm, and aspect ratio of 1.3 show insignificant scattering of light with wavelength above 500 nm and lower the reflectance by a factor of two.

U2 - 10.1063/1.4754691

DO - 10.1063/1.4754691

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 13

VL - 101

SP - 131902

ER -