Minimizing scattering from antireflective surfaces replicated from low-aspect-ratio black silicon
Publication: Research - peer-review › Journal article – Annual report year: 2012
Standard
Minimizing scattering from antireflective surfaces replicated from low-aspect-ratio black silicon. / Christiansen, Alexander Bruun; Clausen, Jeppe; Mortensen, N. Asger; Kristensen, Anders.
In: Applied Physics Letters, Vol. 101, No. 13, 2012, p. 131902.Publication: Research - peer-review › Journal article – Annual report year: 2012
Harvard
APA
CBE
MLA
Vancouver
Author
Bibtex
}
RIS
TY - JOUR
T1 - Minimizing scattering from antireflective surfaces replicated from low-aspect-ratio black silicon
A1 - Christiansen,Alexander Bruun
A1 - Clausen,Jeppe
A1 - Mortensen,N. Asger
A1 - Kristensen,Anders
AU - Christiansen,Alexander Bruun
AU - Clausen,Jeppe
AU - Mortensen,N. Asger
AU - Kristensen,Anders
PB - American Institute of Physics
PY - 2012
Y1 - 2012
N2 - The scattering properties of randomly structured antireflective black silicon polymer replica have been investigated. Using a two-step casting process, the structures can be replicated in Ormocomp on areas of up to 3 in. in diameter. Fourier analysis of scanning electron microscopy images of the structures shows that the scattering properties of the surfaces are related to the spatial periods of the nanostructures. Structures with a dominating spatial period of 160 nm, a height of 200 nm, and aspect ratio of 1.3 show insignificant scattering of light with wavelength above 500 nm and lower the reflectance by a factor of two.
AB - The scattering properties of randomly structured antireflective black silicon polymer replica have been investigated. Using a two-step casting process, the structures can be replicated in Ormocomp on areas of up to 3 in. in diameter. Fourier analysis of scanning electron microscopy images of the structures shows that the scattering properties of the surfaces are related to the spatial periods of the nanostructures. Structures with a dominating spatial period of 160 nm, a height of 200 nm, and aspect ratio of 1.3 show insignificant scattering of light with wavelength above 500 nm and lower the reflectance by a factor of two.
U2 - 10.1063/1.4754691
DO - 10.1063/1.4754691
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 13
VL - 101
SP - 131902
ER -