Minimizing scattering from antireflective surfaces replicated from low-aspect-ratio black silicon

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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The scattering properties of randomly structured antireflective black silicon polymer replica have been investigated. Using a two-step casting process, the structures can be replicated in Ormocomp on areas of up to 3 in. in diameter. Fourier analysis of scanning electron microscopy images of the structures shows that the scattering properties of the surfaces are related to the spatial periods of the nanostructures. Structures with a dominating spatial period of 160 nm, a height of 200 nm, and aspect ratio of 1.3 show insignificant scattering of light with wavelength above 500 nm and lower the reflectance by a factor of two.
Original languageEnglish
JournalApplied Physics Letters
Publication date2012
Volume101
Journal number13
Pages131902
ISSN0003-6951
DOIs
StatePublished

Bibliographical note

Copyright (2012) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (citation of published article) and may be found at http://apl.aip.org/resource/1/applab/v101/i13/p131902_s1.

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