Publication: Research - peer-review › Article in proceedings – Annual report year: 2012
The M4PP measurement technique has gained increased interest from the semiconductor industry for direct sheet resistance measurements on ultra thin layers and small structures/pads. Several fully automatic microRSP probing tools are today in use for in-line sheet resistance measurements on blanket and patterned wafers. Using the next generation of microRSP probing tools it will be possible to perform both sheet resistance, mobility and active carrier density measurements using the collinear M4PP. In this article we demonstrate the various techniques necessary to perform high quality measurements using the M4PP and present the technical progress made during the last few years.
|Title of host publication||Proceedings of the 12th International Workshop on Junction Technology|
|Number of pages||6|
|State||Published - 2012|
|Event||12th International Workshop on Junction Technology - Shanghai, China|
|Conference||12th International Workshop on Junction Technology|
|???event.location???||FuXuan Hotel, Fudan University|
|Period||14/05/2012 → 15/05/2012|
|Citations||Error in DOI please contact firstname.lastname@example.org|
- Accuracy, Loading, Probes
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