Low pressure water vapour plasma treatment of surfaces for biomolecules decontamination.

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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Low pressure water vapour plasma treatment of surfaces for biomolecules decontamination. / Fumagalli, F; Kylian, O; Amato, Letizia; Hanus, J; Rossi, F.

In: Journal of Physics D: Applied Physics, Vol. 45, No. 13, 2012, p. 135203.

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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Author

Fumagalli, F; Kylian, O; Amato, Letizia; Hanus, J; Rossi, F / Low pressure water vapour plasma treatment of surfaces for biomolecules decontamination.

In: Journal of Physics D: Applied Physics, Vol. 45, No. 13, 2012, p. 135203.

Publication: Research - peer-reviewJournal article – Annual report year: 2012

Bibtex

@article{bbf7c5b4c285431c9f775588cfe94e2c,
title = "Low pressure water vapour plasma treatment of surfaces for biomolecules decontamination.",
author = "F Fumagalli and O Kylian and Letizia Amato and J Hanus and F Rossi",
year = "2012",
doi = "10.1088/0022-3727/45/13/135203",
volume = "45",
pages = "135203",
journal = "Journal of Physics D: Applied Physics",
issn = "0022-3727",
publisher = "Institute of Physics Publishing Ltd.",
number = "13",

}

RIS

TY - JOUR

T1 - Low pressure water vapour plasma treatment of surfaces for biomolecules decontamination.

AU - Fumagalli,F

AU - Kylian,O

AU - Amato,Letizia

AU - Hanus,J

AU - Rossi,F

PY - 2012

Y1 - 2012

N2 - Decontamination treatments of surfaces are performed on bacterial spores, albumin and brain homogenate used as models of biological contaminations in a low-pressure, inductively coupled plasma reactor operated with water-vapour-based gas mixtures. It is shown that removal of contamination can be achieved using pure H2O or Ar/H2O mixtures at low temperatures with removal rates comparable to oxygen-based mixtures. Particle fluxes (Ar+ ions, O and H atomic radicals and OH molecular radicals) from water vapour discharge are measured by optical emission spectroscopy and Langmuir probe under several operating conditions. Analysis of particle fluxes and removal rates measurements illustrates the role of ion bombardment associated with O radicals, governing the removal rates of organic matter. Auxiliary role of hydroxyl radicals is discussed on the basis of experimental data. The advantages of a water vapour plasma process are discussed for practical applications in medical devices decontamination.

AB - Decontamination treatments of surfaces are performed on bacterial spores, albumin and brain homogenate used as models of biological contaminations in a low-pressure, inductively coupled plasma reactor operated with water-vapour-based gas mixtures. It is shown that removal of contamination can be achieved using pure H2O or Ar/H2O mixtures at low temperatures with removal rates comparable to oxygen-based mixtures. Particle fluxes (Ar+ ions, O and H atomic radicals and OH molecular radicals) from water vapour discharge are measured by optical emission spectroscopy and Langmuir probe under several operating conditions. Analysis of particle fluxes and removal rates measurements illustrates the role of ion bombardment associated with O radicals, governing the removal rates of organic matter. Auxiliary role of hydroxyl radicals is discussed on the basis of experimental data. The advantages of a water vapour plasma process are discussed for practical applications in medical devices decontamination.

U2 - 10.1088/0022-3727/45/13/135203

DO - 10.1088/0022-3727/45/13/135203

M3 - Journal article

VL - 45

SP - 135203

JO - Journal of Physics D: Applied Physics

T2 - Journal of Physics D: Applied Physics

JF - Journal of Physics D: Applied Physics

SN - 0022-3727

IS - 13

ER -