Large area negative ion source based on matrix ECR cells for fast silicon etching

Publication: Research - peer-reviewConference abstract in proceedings – Annual report year: 2009

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Original languageEnglish
Title of host publicationProceedings
Publication date2009
Pages49-50
StatePublished

Conference

Conference31st International Symposium on Dry Process
CountryKorea, Republic of
CityBusan
Period24/09/0925/09/09
Internet addresshttp://www.plasma.engg.nagoya-u.ac.jp/dps2009/

Keywords

  • Plasma processing, Fusion energy
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