Intensity Mapping for Mask Projection based Photopolymerization

Research output: Research - peer-reviewConference abstract for conference – Annual report year: 2018

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Currently, the industrial de-facto assumption for photopolymerizationsystems is that the ultraviolet light of the mask-projection is uniformly distributed. This paper presents a method for measuring this intensity field or distribution of this mask-projection. By measuring the light distribution, it is shown that the emitted light is not uniformly distributed and thus the current assumption is invalid. Furthermore, a methodology for obtaining a mask to compensate for the irregularities of the projected light, that will ensure an even and controlled exposure of the photopolymer, is presented. Accordingly, it is demonstrated that this mask compensates for such irregularities, making the light projection significantly more uniformly distributed.
Original languageEnglish
Publication date2018
Number of pages5
StatePublished - 2018
Event2018 ASPE and euspen Summer Topical Meeting - Lawrence Berkeley National Laboratory, Berkeley, United States
Duration: 22 Jul 201825 Jul 2018

Conference

Conference2018 ASPE and euspen Summer Topical Meeting
LocationLawrence Berkeley National Laboratory
CountryUnited States
CityBerkeley
Period22/07/201825/07/2018
OtherJoint Special Interest Group meeting: Additive Manufacturing
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