High Throughput Nanofabrication of Silicon Nanowire and Carbon Nanotube Tips on AFM Probes by Stencil-Deposited Catalysts
Publication: Research - peer-review › Journal article – Annual report year: 2011
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High Throughput Nanofabrication of Silicon Nanowire and Carbon Nanotube Tips on AFM Probes by Stencil-Deposited Catalysts. / Engstrøm, Daniel Southcott; Savu, Veronica; Zhu, Xueni; Bu, Ian Y. Y.; Milne, William I.; Brugger, Jürgen; Bøggild, Peter.
In: Nano Letters, Vol. 11, No. 4, 2011, p. 1568-1574.Publication: Research - peer-review › Journal article – Annual report year: 2011
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TY - JOUR
T1 - High Throughput Nanofabrication of Silicon Nanowire and Carbon Nanotube Tips on AFM Probes by Stencil-Deposited Catalysts
A1 - Engstrøm,Daniel Southcott
A1 - Savu,Veronica
A1 - Zhu,Xueni
A1 - Bu,Ian Y. Y.
A1 - Milne,William I.
A1 - Brugger,Jürgen
A1 - Bøggild,Peter
AU - Engstrøm,Daniel Southcott
AU - Savu,Veronica
AU - Zhu,Xueni
AU - Bu,Ian Y. Y.
AU - Milne,William I.
AU - Brugger,Jürgen
AU - Bøggild,Peter
PB - American Chemical Society
PY - 2011
Y1 - 2011
N2 - A new and versatile technique for the wafer scale nanofabrication of silicon nanowire (SiNW) and multiwalled carbon nanotube (MWNT) tips on atomic force microscope (AFM) probes is presented. Catalyst material for the SiNW and MWNT growth was deposited on prefabricated AFM probes using aligned wafer scale nanostencil lithography. Individual vertical SiNWs were grown epitaxially by a catalytic vapor−liquid−solid (VLS) process and MWNTs were grown by a plasma-enhanced chemical vapor (PECVD) process on the AFM probes. The AFM probes were tested for imaging micrometers-deep trenches, where they demonstrated a significantly better performance than commercial high aspect ratio tips. Our method demonstrates a reliable and cost-efficient route toward wafer scale manufacturing of SiNW and MWNT AFM probes.
AB - A new and versatile technique for the wafer scale nanofabrication of silicon nanowire (SiNW) and multiwalled carbon nanotube (MWNT) tips on atomic force microscope (AFM) probes is presented. Catalyst material for the SiNW and MWNT growth was deposited on prefabricated AFM probes using aligned wafer scale nanostencil lithography. Individual vertical SiNWs were grown epitaxially by a catalytic vapor−liquid−solid (VLS) process and MWNTs were grown by a plasma-enhanced chemical vapor (PECVD) process on the AFM probes. The AFM probes were tested for imaging micrometers-deep trenches, where they demonstrated a significantly better performance than commercial high aspect ratio tips. Our method demonstrates a reliable and cost-efficient route toward wafer scale manufacturing of SiNW and MWNT AFM probes.
KW - carbon nanotubes
KW - high aspect ratio
KW - AFM
KW - Nanostencil
KW - silicon nanowires
U2 - 10.1021/nl104384b
DO - 10.1021/nl104384b
JO - Nano Letters
JF - Nano Letters
SN - 1530-6984
IS - 4
VL - 11
SP - 1568
EP - 1574
ER -