High pattern density nanoimprint lithography stamps fabricated by means of negative electron beam lithography resist, TEBN-1, and dry etching in silicon
Publication: Research - peer-review › Poster – Annual report year: 2005
|Conference||The 4th Internternational Conference on Nanoimprint and Nanoprint, NNT'05, 19 - 21 October|
|Period||01/01/06 → …|
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