Fundamental size limitations of micro four-point probes
Publication: Research - peer-review › Journal article – Annual report year: 2009
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Fundamental size limitations of micro four-point probes. / Ansbæk, Thor; Petersen, Dirch Hjorth; Hansen, Ole; Larsen, Jakob B.; Hansen, Torben Mikael; Bøggild, Peter.
In: Microelectronic Engineering, Vol. 86, No. 4-6, 2009, p. 987-990.Publication: Research - peer-review › Journal article – Annual report year: 2009
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TY - JOUR
T1 - Fundamental size limitations of micro four-point probes
A1 - Ansbæk,Thor
A1 - Petersen,Dirch Hjorth
A1 - Hansen,Ole
A1 - Larsen,Jakob B.
A1 - Hansen,Torben Mikael
A1 - Bøggild,Peter
AU - Ansbæk,Thor
AU - Petersen,Dirch Hjorth
AU - Hansen,Ole
AU - Larsen,Jakob B.
AU - Hansen,Torben Mikael
AU - Bøggild,Peter
PB - Elsevier BV
PY - 2009
Y1 - 2009
N2 - The continued down-scaling of integrated circuits and magnetic tunnel junctions (MTJ) for hard disc read heads presents a challenge to current metrology technology. The four-point probes (4PP), currently used for sheet resistance characterization in these applications, therefore must be down-scaled as well in order to correctly characterize the extremely thin films used. This presents a four-point probe design and fabrication challenge. We analyze the fundamental limitation on down-scaling of a generic micro four-point probe (M4PP) in a comprehensive study, where mechanical, thermal, and electrical effects are considered. We show that the most severe limits on down-scaling from a state of the art M4PP are set by electromigration, probe fracture or material strength, and thermal effects. Compared to current state of the art probes, however, there is still room for down-scaling.
AB - The continued down-scaling of integrated circuits and magnetic tunnel junctions (MTJ) for hard disc read heads presents a challenge to current metrology technology. The four-point probes (4PP), currently used for sheet resistance characterization in these applications, therefore must be down-scaled as well in order to correctly characterize the extremely thin films used. This presents a four-point probe design and fabrication challenge. We analyze the fundamental limitation on down-scaling of a generic micro four-point probe (M4PP) in a comprehensive study, where mechanical, thermal, and electrical effects are considered. We show that the most severe limits on down-scaling from a state of the art M4PP are set by electromigration, probe fracture or material strength, and thermal effects. Compared to current state of the art probes, however, there is still room for down-scaling.
U2 - 10.1016/j.mee.2008.11.029
DO - 10.1016/j.mee.2008.11.029
JO - Microelectronic Engineering
JF - Microelectronic Engineering
SN - 0167-9317
IS - 4-6
VL - 86
SP - 987
EP - 990
ER -