Fast & scalable pattern transfer via block copolymer nanolithography

Research output: Research - peer-reviewJournal article – Annual report year: 2015

DOI

View graph of relations

A fully scalable and efficient pattern transfer process based on block copolymer (BCP) self-assembling directly on various substrates is demonstrated. PS-rich and PDMS-rich poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) copolymers are used to give monolayer sphere morphology after spin-casting of solutions with selective solvents relative to the majority block. The pattern is directly formed during spin-casting at room temperature, which takes less than 20 seconds, without any preliminary surface treatment of the substrate and without any subsequent annealing. The self-assembled BCPs are transformed into hard lithography masks by oxidation of PDMS in oxygen plasma. The hard masks are then used to fabricate full wafer scale arrays of nano-pillars and nano-wells on various substrates, including polymers and silicon. The demonstrated BCP nano-lithography process opens up numerous applications not relying on long range lateral order, including fabrication of substrates for catalysis, solar cells, sensors, ultrafiltration membranes and templating of semiconductors or metals.
Original languageEnglish
JournalR S C Advances
Volume5
Issue number124
Pages (from-to)102619-102624
Number of pages6
ISSN2046-2069
DOIs
StatePublished - 2015
CitationsWeb of Science® Times Cited: 3
Download as:
Download as PDF
Select render style:
APAAuthorCBE/CSEHarvardMLAStandardVancouverShortLong
PDF
Download as HTML
Select render style:
APAAuthorCBE/CSEHarvardMLAStandardVancouverShortLong
HTML
Download as Word
Select render style:
APAAuthorCBE/CSEHarvardMLAStandardVancouverShortLong
Word

ID: 119412145