Experimental investigation on the influence of instrument settings on pixel size and nonlinearity in SEM image formation

Publication: Research - peer-reviewArticle in proceedings – Annual report year: 2010

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The work deals with an experimental investigation on the influence of three Scanning Electron Microscope (SEM) instrument settings, accelerating voltage, spot size and magnification, on the image formation process. Pixel size and nonlinearity were chosen as output parameters related to image quality and resolution. A silicon grating calibrated artifact was employed to investigate qualitatively and quantitatively, through a designed experiment approach, the parameters relevance. SEM magnification was found to account by far for the largest contribution on both parameters under consideration. Optimal instrument settings were also identified.
Original languageEnglish
Title of host publicationProceedings of the 10th euspen International Conference
Volume1
Publication date2010
Pages192-195
ISBN (print)978-0-9553082-8-4
StatePublished - 2010
Event10th International Conference of the European Society for Precision Engineering and Nanotechnology - Zürich, Switzerland

Conference

Conference10th International Conference of the European Society for Precision Engineering and Nanotechnology
Number10
CountrySwitzerland
CityZürich
Period18/05/200822/05/2008

    Keywords

  • SEM
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