Discrete and modal focusing effects: principles and applications

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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Discrete and modal focusing effects: principles and applications. / Stamate, Eugen.

In: Plasma Physics and Controlled Fusion, Vol. 54, No. 12, 2012, p. 124048.

Publication: Research - peer-reviewJournal article – Annual report year: 2012

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Author

Stamate, Eugen / Discrete and modal focusing effects: principles and applications.

In: Plasma Physics and Controlled Fusion, Vol. 54, No. 12, 2012, p. 124048.

Publication: Research - peer-reviewJournal article – Annual report year: 2012

Bibtex

@article{833ecb3867224084981c659ee18bdc2c,
title = "Discrete and modal focusing effects: principles and applications",
publisher = "Institute of Physics Publishing",
author = "Eugen Stamate",
year = "2012",
doi = "10.1088/0741-3335/54/12/124048",
volume = "54",
number = "12",
pages = "124048",
journal = "Plasma Physics and Controlled Fusion",
issn = "0741-3335",

}

RIS

TY - JOUR

T1 - Discrete and modal focusing effects: principles and applications

A1 - Stamate,Eugen

AU - Stamate,Eugen

PB - Institute of Physics Publishing

PY - 2012

Y1 - 2012

N2 - Charge flux distribution on the surface of biased electrodes of different geometries immersed in a plasma is investigated by three-dimensional simulations and experiments. It is demonstrated that the sheath surrounding the electrodes that interface insulators acts as an electrostatic lens, focusing the charges to distinct locations on the electrode surface depending on the entrance coordinates at the sheath edge. Two focusing effects are identified. Discrete focusing leads to the formation of a passive surface of no ion impact, near the edge of the electrodes interfacing insulators. Modal focusing results in the formation of certain ‘modal spots’ and/or ‘modal lines’. Several phenomenological aspects and potential applications are reviewed and further discussed, including charge focusing by a three-dimensional plasma–sheath–lens, ion dose uniformity during plasma immersion ion implantation, mass spectrometry and plasma monitoring.

AB - Charge flux distribution on the surface of biased electrodes of different geometries immersed in a plasma is investigated by three-dimensional simulations and experiments. It is demonstrated that the sheath surrounding the electrodes that interface insulators acts as an electrostatic lens, focusing the charges to distinct locations on the electrode surface depending on the entrance coordinates at the sheath edge. Two focusing effects are identified. Discrete focusing leads to the formation of a passive surface of no ion impact, near the edge of the electrodes interfacing insulators. Modal focusing results in the formation of certain ‘modal spots’ and/or ‘modal lines’. Several phenomenological aspects and potential applications are reviewed and further discussed, including charge focusing by a three-dimensional plasma–sheath–lens, ion dose uniformity during plasma immersion ion implantation, mass spectrometry and plasma monitoring.

U2 - 10.1088/0741-3335/54/12/124048

DO - 10.1088/0741-3335/54/12/124048

JO - Plasma Physics and Controlled Fusion

JF - Plasma Physics and Controlled Fusion

SN - 0741-3335

IS - 12

VL - 54

SP - 124048

ER -