Development of highly electronegative plasma sources for negative ion etching, Plasma Etch and Strip in Microelectronics
Publication: Research - peer-review › Conference abstract in proceedings – Annual report year: 2009
| Original language | English |
|---|---|
| Title | Proceedings |
| Publication date | 2009 |
| State | Published |
Conference
| Conference | 2nd International workshop |
|---|---|
| City | Leuven (BE) |
| Period | 01-01-09 → … |
Keywords
- Plasma processing, Fusion energy
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ID: 4009902