Development of highly electronegative plasma sources for negative ion etching, Plasma Etch and Strip in Microelectronics

Publication: Research - peer-reviewConference abstract in proceedings – Annual report year: 2009

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Original languageEnglish
Title of host publicationProceedings
Publication date2009
StatePublished

Conference

Conference2nd International workshop
CityLeuven (BE)
Period01/01/09 → …

Keywords

  • Plasma processing, Fusion energy
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