Development of highly electronegative plasma sources for negative ion etching, Plasma Etch and Strip in Microelectronics
Publication: Research - peer-review › Conference abstract in proceedings – Annual report year: 2009
| Original language | English |
|---|---|
| Title of host publication | Proceedings |
| Publication date | 2009 |
| State | Published - 2009 |
| Event | 2nd International workshop - Leuven (BE) |
Conference
| Conference | 2nd International workshop |
|---|---|
| City | Leuven (BE) |
| Period | 01/01/2009 → … |
- Plasma processing, Fusion energy
Keywords
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ID: 4009902