Development of highly electronegative plasma sources for negative ion etching, Plasma Etch and Strip in Microelectronics
Publication: Research - peer-review › Conference abstract in proceedings – Annual report year: 2009
Original language | English |
---|---|
Title of host publication | Proceedings |
Publication date | 2009 |
State | Published - 2009 |
Event | 2nd International workshop - Leuven (BE) |
Conference
Conference | 2nd International workshop |
---|---|
City | Leuven (BE) |
Period | 01/01/2009 → … |
- Plasma processing, Fusion energy
Keywords
Download as:
ID: 4009902