Comparison between different dispersion engineering methods in slow light photonic crystal waveguides

Publication: Research - peer-reviewConference article – Annual report year: 2011

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Comparison between different dispersion engineering methods in slow light photonic crystal waveguides. / Wang, Fengwen; Jensen, Jakob Søndergaard; Sigmund, Ole.

In: AIP Conference Proceedings, Vol. 1398, 2011, p. 180-182.

Publication: Research - peer-reviewConference article – Annual report year: 2011

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Author

Wang, Fengwen; Jensen, Jakob Søndergaard; Sigmund, Ole / Comparison between different dispersion engineering methods in slow light photonic crystal waveguides.

In: AIP Conference Proceedings, Vol. 1398, 2011, p. 180-182.

Publication: Research - peer-reviewConference article – Annual report year: 2011

Bibtex

@article{58fc45af55b24895942ceb825d6405f8,
title = "Comparison between different dispersion engineering methods in slow light photonic crystal waveguides",
author = "Fengwen Wang and Jensen, {Jakob Søndergaard} and Ole Sigmund",
year = "2011",
doi = "10.1063/1.3644251",
volume = "1398",
pages = "180--182",
journal = "A I P Conference Proceedings Series",
issn = "0094-243X",
publisher = "Springer New York LLC",

}

RIS

TY - CONF

T1 - Comparison between different dispersion engineering methods in slow light photonic crystal waveguides

AU - Wang,Fengwen

AU - Jensen,Jakob Søndergaard

AU - Sigmund,Ole

PY - 2011

Y1 - 2011

N2 - This paper compares the performance of different dispersion engineering methods in slow light photonic crystal waveguides, i.e., geometrical parameter optimization and topology optimization. In both methods, the design robustness is enforced by considering the dilated, intermediate and eroded designs corresponding to the under-, standard- and over-etching processes in the manufacturing process. For vg* = c/50, the parameter optimized design achieves a normalized group index bandwidth product of 0.33 and the topology optimized design achieves 0.53. The numerical results illustrate that waveguides with optimized hole sizes and positions can be efficient for dispersion engineering but that large improvements are possible if irregular geometries are allowed using topology optimization.

AB - This paper compares the performance of different dispersion engineering methods in slow light photonic crystal waveguides, i.e., geometrical parameter optimization and topology optimization. In both methods, the design robustness is enforced by considering the dilated, intermediate and eroded designs corresponding to the under-, standard- and over-etching processes in the manufacturing process. For vg* = c/50, the parameter optimized design achieves a normalized group index bandwidth product of 0.33 and the topology optimized design achieves 0.53. The numerical results illustrate that waveguides with optimized hole sizes and positions can be efficient for dispersion engineering but that large improvements are possible if irregular geometries are allowed using topology optimization.

U2 - 10.1063/1.3644251

DO - 10.1063/1.3644251

M3 - Conference article

VL - 1398

SP - 180

EP - 182

JO - A I P Conference Proceedings Series

T2 - A I P Conference Proceedings Series

JF - A I P Conference Proceedings Series

SN - 0094-243X

ER -