A METHOD FOR CREATING STRUCTURES OR DEVICES USING AN ORGANIC ICE RESIST

Publication: ResearchPatent – Annual report year: 2017

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The invention relates to a method for creating an organic resist on a surface of a cooled substrate, the method comprising the steps of condensing a vapour into a solid film on the surface of the cooled substrate; patterning at least part of the solid film by exposing selected portions of said solid film to at least one electron beam thereby creating the organic resist on 5 the surface of the cooled substrate in accordance with a predetermined pattern; wherein the created organic resist remains essentially intact at ambient conditions; and using the created organic resist as a mask for creating semiconductor structures and/or semiconductor devices.

Original languageEnglish
IPCB29C 67/ 00 A I
Patent numberWO2017191079
Date09/11/2017
CountryInternational Bureau of the World Intellectual Property Organization (WIPO)
StatePublished - 9 Nov 2017
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