Eugen Stamate

  1. 2011
  2. Published

    Extraction of a linearly distributed focused ion beam from a matrix-ECR plasma produced in reactive gases. / Stamate, Eugen.

    Proceedings. 2011. p. 59-60.

    Publication: Research - peer-reviewArticle in proceedings – Annual report year: 2011

  3. Published

    Plasma-Based Depollution of Exhausts: Principles, State of the Art and Future Prospects. / Brandenburg, Ronny; Barankova, Hana; Bardos, Ladislav; Chmielewski, Andrzej G.; Dors, Miroslaw; Grosch, Helge; Holub, Marcin; Jögi, Indrek; Laan, Matti; Mizeraczyk, Jerzy; Pawelec, Andrzej; Stamate, Eugen.

    Monitoring, Control and Effects of Air Pollution. ed. / Andrzej G. Chmielewski. InTech, 2011. p. 229-254.

    Publication: Research - peer-reviewBook chapter – Annual report year: 2011

  4. Published
  5. Published

    Charge modulated interfacial conductivity in SrTiO3-based oxide heterostructures. / Chen, Yunzhong; Stamate, Eugen; Pryds, Nini; Sun, J. R.; Shen, B. G.; Linderoth, Søren.

    In: Applied Physics Letters, Vol. 98, No. 23, 2011, p. 232105 (3 pages).

    Publication: Research - peer-reviewJournal article – Annual report year: 2011

  6. Published

    Metallic and Insulating Interfaces of Amorphous SrTiO3-Based Oxide Heterostructures. / Chen, Yunzhong; Pryds, Nini; Kleibeuker, Josée E.; Koster, Gertjan; Sun, Jirong; Stamate, Eugen; Shen, Baogen; Rijnders, Guus; Linderoth, Søren.

    In: Nano Letters, Vol. 11, No. 9, 2011, p. 3774-3778.

    Publication: Research - peer-reviewJournal article – Annual report year: 2011

  7. 2010
  8. Published

    Ion Beam Extraction by Discrete Ion Focusing. / Stamate, Eugen (Inventor).

    Patent No.: WO2010040805. Apr 15, 2010.

    Publication: ResearchPatent – Annual report year: 2010

  9. Published

    Ion Mass Determination. / Stamate, Eugen (Inventor).

    Patent No.: WO2010094605. Aug 26, 2010.

    Publication: ResearchPatent – Annual report year: 2010

  10. Published

    Extraction of positive and negative ion beams by discrete and modal focusing effects. / Stamate, Eugen.

    2010. Abstract from 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France.

    Publication: ResearchConference abstract for conference – Annual report year: 2010

  11. Published

    Fast silicon etching by negative ions in a matrix ECR plasma source. / Draghici, Mihai; Stamate, Eugen.

    2010. Abstract from 3rd Workshop on Plasma Etch and Strip in Microelectronics, Grenoble (FR), 4-5 Mar., .

    Publication: ResearchConference abstract for conference – Annual report year: 2010

  12. Published

    Investigation of Negative Ion Production in an Ar/CF4 Matrix-ECR Plasma Source with Transversal Magnetic Filter. / Baele, Pierre; Draghici, Mihai; Stamate, Eugen.

    2010. Abstract from 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France.

    Publication: ResearchConference abstract for conference – Annual report year: 2010

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